In the past, the pull-in parameters of parallel plate MEMS devices with the fringing field effect are often estimated using finite element method ( FEM). 在过去的研究中,对漏电场不能忽略的平行平板式静电微执行器,通常只能采用有限元法数值求解。
An analytical subthreshold surface potential model for the DMG SOI MOSFET with high k gate dielectrics, which accounts for the short channel effect and the fringing field effect, has been developed. 还研究了高k栅介质对DMGSOIMOSFET的影响,为高k栅介质DMGSOIMOSFET建立了表面势模型,模型中考虑了边缘电场效应和短沟道效应。
And the model of the fringing field capacitances are set up. The relevant data of pull-in phenomenon are obtained in the case of taking into account the fringing field effect. 然后介绍了漏电场对微执行器pull-in参数的影响,建立相关的漏电场的模型,在考虑漏电场的情况下,得出了pull-in现象的相关数据。